ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,422,756, issued on Sept. 23, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).
"Optical system, in particular lithography system" was invented by Tanja Mueller (Heidenheim, Germany), Rudi Littelink (Bathmen, Netherlands) and Johannes Bauer (Giengen an der Brenz, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "An optical system, such as a lithography system, comprises: a plate-shaped component, such as a stop element; an optionally frame-shaped holder for holding the component; and a plurality of webs for connecting the plate-shaped component to the holder. The plate-shaped component is releasably connected to the preferably wire-shaped ...