US Patent Issued to Carl Zeiss SMT on Sept. 16 for "Optical system, in particular for microlithography, and method for operating an optical system" (German Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,416,865, issued on Sept. 16, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"Optical system, in particular for microlithography, and method for operating an optical system" was invented by Conrad Wolke (Aalen, Germany) and Barbara Moser (Sontheim an der Brenz, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "An optical system, in particular for microlithography, comprises a laser light source for generating a multiplicity of light pulses, and a control unit configured to control the laser light source in such a way that, for a light pulse sequence generated by the laser light source, the time period between respectively successive lig...