ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,436,361, issued on Oct. 7, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).
"Projection exposure apparatus for semiconductor lithography" was invented by Joachim Hartjes (Aalen, Germany), Alexander Wolf (Essingen, Germany) and Toralf Gruner (Aalen-Hofen, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A projection exposure apparatus for semiconductor lithography includes a mirror and a temperature-regulating device for regulating temperature on the basis of radiation. The mirror includes at least one cutout. The temperature-regulating device includes a temperature-regulating body arranged without contact in the cutout of the mirror. The ...