ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,468,230, issued on Nov. 11, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).
"Optical component and optical system, in particular for microlithography" was invented by Jeffrey Erxmeyer (Oberkochen, Germany), Martin Hermann (Heidenheim, Germany), Nils Lundt (Ulm, Germany) and Conrad Wolke (Aalen, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "An optical component comprises a first layer system exhibiting a first wavelength-dependent reflectivity curve when electromagnetic radiation impinges thereon, and at least one second layer system exhibiting a second wavelength-dependent reflectivity curve when electromagnetic radiation impinges th...