US Patent Issued to Carl Zeiss SMT on May 13 for "Projection exposure apparatus for semiconductor lithography with a vibration damper and method for designing a vibration damper" (German Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,298,675, issued on May 13, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"Projection exposure apparatus for semiconductor lithography with a vibration damper and method for designing a vibration damper" was invented by Philipp Gaida (Aalen, Germany), Michael Erath (Dietenheim, Germany) and Florian Herold (Aalen, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A projection exposure apparatus has a vibration damper with a holder and a mass that is connected to the holder via a damping element. The vibration damper comprises a temperature control device for the temperature control of the damping element. The disclosure also relates to a...