US Patent Issued to Carl Zeiss SMT on June 3 for "Device and method for determining placements of pattern elements of a reflective photolithographic mask in the operating environment thereof" (German Inventor)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,321,091, issued on June 3, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"Device and method for determining placements of pattern elements of a reflective photolithographic mask in the operating environment thereof" was invented by Carola Blaesing-Bangert (Kassel, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present application relates to a device for determining placements of pattern elements of a reflective photolithographic mask in the operating environment thereof, wherein the device comprises: (a) at least one first means configured for determining surface unevenness data of a rear side of the reflective photolithographic ...