US Patent Issued to Carl Zeiss SMT on June 17 for "Method for maintaining a projection exposure apparatus, service module and arrangement for semiconductor lithography" (German Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,332,576, issued on June 17, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"Method for maintaining a projection exposure apparatus, service module and arrangement for semiconductor lithography" was invented by Dirk Heinrich Ehm (Beckingen, Germany), Jens Kugler (Aalen, Germany), Benjahman Julius Modeste (Elchingen, Germany) and Marwene Nefzi (Ulm, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for maintaining a projection exposure apparatus comprising at least two modules and a reference element, wherein the modules are referenced to the reference element, comprises: removing a module; attaching a service module to or in the...