ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,547,085, issued on Feb. 10, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).
"System and projection exposure apparatus" was invented by Marwene Nefzi (Ulm, Germany) and Jens Kugler (Aalen, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A system for a projection exposure apparatus which comprises a first component, a second component, and a decoupling device configured to decouple the second component in more than one degree of freedom from mechanical excitations of the first component. The decoupling device comprises first decoupling elements which have a positive stiffness. The decoupling device also comprises second decoupling elemen...