ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,547,086, issued on Feb. 10, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).
"Projection exposure apparatus for semiconductor lithography" was invented by Klaus Rief (Aalen-Oberalfingen, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A projection exposure apparatus for semiconductor lithography includes component having a fluid channel and a device for providing a fluid for flowing through the fluid channel. The fluid channel is connected to the device via a supply line and an outgoing line. The supply line and the outgoing line are connected to one another in parallel with the fluid channel via a short circuit."
The patent was filed ...