US Patent Issued to Carl Zeiss SMT on Dec. 9 for "Method, device and computer program for repairing a mask defect" (German Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,493,238, issued on Dec. 9, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"Method, device and computer program for repairing a mask defect" was invented by Johannes Schoneberg (Darmstadt, Germany), Michael Budach (Hanau, Germany), Christof Baur (Darmstadt, Germany) and Jens Oster (Ober-Ramstadt, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method, a device and a computer program for repairing a defect of a mask for lithography, in particular an EUV mask, are described.A method of repairing a defect of a mask for lithography, in particular an EUV mask, comprises the following steps: (a.) carrying out a first repair step on the defe...