ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,504,698, issued on Dec. 23, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).
"Mounting for a lithography system, and lithography system" was invented by Boaz Pnini (Goeggingen, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A mounting for a lithography system comprises: a mounted element; a mounting element; and fastening elements which together secure the mounted element relative to the mounting element in at least one degree of freedom. A spacing is provided between the mounted element and the mounting element in the direction of the at least one degree of freedom, and each fastening element exerts a force on the mounted element excl...