ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,393,119, issued on Aug. 19, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).
"Optical system and lithography apparatus" was invented by Dirk Schaffer (Jena, Germany) and Wolfgang Scherm (Nattheim, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "An optical system for lithography apparatus comprises a movable element and a functional element having a first and second portions. The optical element is designed as an optical element or as a reference structure. The first portion is fastened to the movable element by a joining mechanism along a fastening plane. The second portion comprises a functional surface. The functional element comprise...