ALEXANDRIA, Va., June 5 -- United States Patent no. 12,276,815, issued on April 15, was assigned to CARL ZEISS SMT GMBH (Oberkochen, Germany) and ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"EUV collector mirror" was invented by Marcus Van De Kerkhof (Veldhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "An EUV collector mirror has a reflection surface (16) to reflect usable EUV light which impinges on the reflection surface (16) from a source region (17) to a subsequent EUV optics. The reflection surface (16) carries a pump light grating structure (19) configured to retroreflect pump light (22) which impinges upon the pump light grating structure (19) from the source region (17) back to ...