US Patent Issued to Carl Zeiss MultiSEM on April 8 for "Method for area-wise inspecting a sample via a multi-beam particle microscope, computer program product and multi-beam particle microscope for semiconductor sample inspection, and its use" (German Inventors)

ALEXANDRIA, Va., April 9 -- United States Patent no. 12,272,519, issued on April 8, was assigned to Carl Zeiss MultiSEM GmbH (Oberkochen, Germany).

"Method for area-wise inspecting a sample via a multi-beam particle microscope, computer program product and multi-beam particle microscope for semiconductor sample inspection, and its use" was invented by Dirk Zeidler (Oberkochen, Germany) and Daniel Boecker (Aalen, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes: providing position data for a plurality of areas on the sample which are to be inspected; providing a first raster arrangement of the plurality of individual particle beams, with a single field of view on the sample assigned to...