US Patent Issued to CANTON LITHO MATERIAL TECHNOLOGY on Aug. 5 for "Highly sequenced copolymer for dual-tone photoresists, resist composition and patterning process thereof" (Chinese Inventors)

ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,379,657, issued on Aug. 5, was assigned to CANTON LITHO MATERIAL TECHNOLOGY INC. (Guangzhou, China).

"Highly sequenced copolymer for dual-tone photoresists, resist composition and patterning process thereof" was invented by Hai Deng (Guangzhou, China) and Min Cao (Guangzhou, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A resin including a highly sequenced copolymer is presented, and the preparation and application of its resist composition is presented. The resist has excellent performance and can promote the development of integrated circuits."

The patent was filed on Jan. 31, 2022, under Application No. 17/589,124.

*For further information, i...