ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,779, issued on Sept. 30, was assigned to CANON K.K. (Tokyo).
"Lithography information processing apparatus, lithography system, storage medium, lithography information processing method, and article manufacturing method" was invented by Atsushi Kusaka (Tochigi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "In order to provide a lithography information processing apparatus that can optimize, for example, adjustment of alignment at an outer circumferential part of a substrate, the lithography information processing apparatus includes a display control unit that causes a layout of a shot region of the substrate used in a lithography apparatus t...