US Patent Issued to CANON on Oct. 7 for "Lithography device, lithography method, and article manufacturing method" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,436,474, issued on Oct. 7, was assigned to CANON K.K. (Tokyo).

"Lithography device, lithography method, and article manufacturing method" was invented by Kazuhiro Sato (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A lithography device includes: a pattern forming unit that forms a pattern in a shot region on a substrate held by a substrate holding unit by using a pattern unit; an acquisition unit that acquires relationships among the amount of positional deviation of the substrate relative to the substrate holding unit, a holding force applied to at least a part of the substrate to hold the substrate, and an overlapping error between the ...