ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,447,668, issued on Oct. 21, was assigned to CANON K.K. (Tokyo).
"Imprint device, imprint method, article manufacturing method, and storage medium" was invented by Hiroyuki Matsuda (Tochigi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention is to provide an imprint device that can form a circuit pattern with high accuracy even if a deviation occurs in a positional relationship between the circuit pattern and an alignment mark. The imprint device performs an imprinting process in which a mold on which a pattern is formed is brought in contact with an imprint material on a substrate and the pattern is transferred to the substrate a...