ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,042, issued on Nov. 4, was assigned to Canon K.K. (Tokyo).
"Planarization system and method" was invented by Niyaz Khusnatdinov (Round Rock, Texas).
According to the abstract* released by the U.S. Patent & Trademark Office: "A planarization system for forming a formable material film on a substrate by using a superstrate is provided. The superstrate has a first side that comes into contact with the formable material in a case where the superstrate is stacked with the substrate, and a second side opposite to the first side. The planarization system has a first conductive portion at the second side of the superstrate and a second conductive portion at the side of the superstrate. Bo...