US Patent Issued to CANON on Nov. 4 for "Liquid discharge apparatus, substrate processing apparatus and article manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,459,271, issued on Nov. 4, was assigned to CANON K.K. (Tokyo).

"Liquid discharge apparatus, substrate processing apparatus and article manufacturing method" was invented by Shugo Nakayama (Tokyo), Tomofumi Nishikawara (Tochigi, Japan), Akiko Iimura (Tochigi, Japan), Masahiro Kuri (Tochigi, Japan) and Tetsuya Yamamoto (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A liquid discharge apparatus including a head configured to discharge a liquid, a chamber configured to contain the head, a circulation system configured to circulate a gas inside the chamber, an exhaust system configured to operate to exhaust the gas to an outside of the chamber...