US Patent Issued to CANON on Nov. 25 for "Measurement apparatus, lithography apparatus and article manufacturing method" (Japanese Inventor)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,481,225, issued on Nov. 25, was assigned to CANON K.K. (Tokyo).

"Measurement apparatus, lithography apparatus and article manufacturing method" was invented by Wataru Yamaguchi (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a measurement apparatus for measuring a position of a first pattern and a position of a second pattern provided in a target object, the apparatus including an image capturing unit including a plurality of pixels which detect light from the first pattern and light from the second pattern, and configured to form an image capturing region used to capture the first pattern and the second pat...