US Patent Issued to CANON on Nov. 25 for "Mark detecting apparatus, mark learning apparatus, substrate processing apparatus, mark detecting method, and manufacturing method of article" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,481,229, issued on Nov. 25, was assigned to CANON K.K. (Tokyo).

"Mark detecting apparatus, mark learning apparatus, substrate processing apparatus, mark detecting method, and manufacturing method of article" was invented by Masashi Yamamoto (Kanagawa, Japan), Tohru Suzuki (Tochigi, Japan), Hisatoshi Neya (Tochigi, Japan), Yoshiaki Kurosawa (Tochigi, Japan), Shingo Yoneda (Tochigi, Japan) and Masanori Hioki (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A mark detecting apparatus includes an imaging unit configured to generate an alignment mark image by imaging of an alignment mark on an object, a detecting unit configured to detect the a...