US Patent Issued to Canon on Nov. 18 for "Exposure method, exposure apparatus, and method for manufacturing article" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,474,641, issued on Nov. 18, was assigned to Canon K.K. (Tokyo).

"Exposure method, exposure apparatus, and method for manufacturing article" was invented by Jinnai Watanabe (Tochigi, Japan) and Jun Moizumi (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An exposure method includes predicting a change in an optical characteristic of a projection optical system in exposing in which exposure processing is performed on a plurality of substrates via the projection optical system, adjusting the optical characteristic based on a prediction result of the predicting before the exposing, and performing the exposing after the adjusting, wherein, in t...