US Patent Issued to CANON on Nov. 11 for "Imprint apparatus for forming a pattern of an imprint material on a substrate-side pattern region of a substrate by using a mold, and related device manufacturing methods" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,468,221, issued on Nov. 11, was assigned to CANON K.K. (Tokyo).

"Imprint apparatus for forming a pattern of an imprint material on a substrate-side pattern region of a substrate by using a mold, and related device manufacturing methods" was invented by Tatsuya Hayashi (Utsunomiya, Japan), Yosuke Murakami (Utsunomiya, Japan), Noriyasu Hasegawa (Utsunomiya, Japan), Hirotoshi Torii (Utsunomiya, Japan) and Yusuke Tanaka (Utsunomiya, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An imprint apparatus that forms a pattern of a resin on a substrate that includes a plurality of substrate-side pattern regions by using a mold. The imprint apparatus includes...