ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,468,229, issued on Nov. 11, was assigned to Canon K.K. (Tokyo).

"Exposure method, exposure apparatus, and method for manufacturing article" was invented by Jun Moizumi (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An exposure method includes performing exposure processing via a projection optical system between a start and an end of the exposure processing on a plurality of substrates included in a lot as exposure, predicting a change in an optical characteristic of the projection optical system during the exposure based on an exposure processing condition of the exposure, determining whether the optical characteristic exceeds a predete...