ALEXANDRIA, Va., June 10 -- United States Patent no. 12,292,681, issued on May 6, was assigned to CANON K.K. (Tokyo).
"Imprint method, imprint apparatus, and method of manufacturing article" was invented by Naosuke Nishimura (Saitama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides an imprint method of forming, using a mold, a pattern of an imprint material on a substrate having a dimension smaller than a dimension of a holding surface of a substrate stage, comprising: causing the holding surface to hold a plate; causing the plate to support the substrate, by causing the holding surface to hold the substrate by via the plate; bringing the mold into contact with the imprint...