ALEXANDRIA, Va., March 12 -- United States Patent no. 12,247,133, issued on March 11, was assigned to CANON K.K. (Tokyo).
"Photocurable composition including a reactive polymer" was invented by Fen Wan (Austin, Texas), Timothy Brian Stachowiak (Austin, Texas) and Weijun Liu (Cedar Park, Texas).
According to the abstract* released by the U.S. Patent & Trademark Office: "A photocurable composition can comprise a polymerizable material, and a photoinitiator, wherein the polymerizable material can comprise at least one polymerizable monomer and at least one reactive polymer. The reactive polymer can have a carbon content of at least 75% based on the total weight of the reactive polymer; a molecular weight of the at least one reactive polymer ...