US Patent Issued to Canon on June 10 for "Method for manufacturing microstructure including cured products of photosensitive resin compositions" (Japanese Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,326,662, issued on June 10, was assigned to Canon K.K. (Tokyo).

"Method for manufacturing microstructure including cured products of photosensitive resin compositions" was invented by Yohei Hamade (Tokyo), Kazunari Ishizuka (Shizuoka, Japan), Satoshi Tsutsui (Kanagawa, Japan), Miho Ishii (Kanagawa, Japan), Haruka Yamaji (Tokyo) and Hikaru Sugimoto (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing a microstructure comprising cured products of photosensitive resin compositions, the method comprising: a step of forming at least two layers of the photosensitive resin compositions each comprising a photopolymerization...