ALEXANDRIA, Va., June 18 -- United States Patent no. 12,326,666, issued on June 10, was assigned to Canon K.K. (Tokyo).
"Exposing apparatus and method for manufacturing article" was invented by Takashi Hayakawa (Tochigi, Japan) and Keiji Emoto (Saitama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The exposing apparatus according to the present invention for exposing a substrate so as to transfer a pattern formed on an original to the substrate by using exposure light from a light source, includes a substrate stage on which the substrate is mounted, a driving unit configured to drive the substrate stage with a plurality of actuators each configured to apply a thrust to the substrate stage in respecti...