US Patent Issued to CANON on June 10 for "Detection apparatus, lithography apparatus, and article manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,326,668, issued on June 10, was assigned to CANON K.K. (Tokyo).

"Detection apparatus, lithography apparatus, and article manufacturing method" was invented by Ryo Nakayama (Tochigi, Japan), Yasuyuki Unno (Tochigi, Japan), Takahiro Matsumoto (Tochigi, Japan), Takafumi Miyaharu (Tochigi, Japan) and Tooru Kawashima (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A detection apparatus that detects a position deviation between an original and a substrate is provided. The apparatus includes an illumination optical system configured to illuminate a first diffraction grating arranged on the original and a second diffraction grating arranged on th...