US Patent Issued to CANON on July 22 for "Method for improving accuracy of imprint force application in imprint lithography" (Texas Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,366,800, issued on July 22, was assigned to CANON K.K. (Tokyo).

"Method for improving accuracy of imprint force application in imprint lithography" was invented by Nilabh K. Roy (Austin, Texas) and Mario Johannes Meissl (Austin, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for correcting a final imprint force FIF in an imprint process is provided. Position traces of an imprint head exercising along a predetermined trajectory are obtained. A force disturbance model is established based on prior position and force traces of the imprint head. A disturbance force Fmod,FIF,i is using a predetermined motion sequence based on the force disturb...