US Patent Issued to Canon on Dec. 30 for "Measuring device, measuring method, substrate processing apparatus, and method of manufacturing product" (Japanese Inventor)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,510,464, issued on Dec. 30, was assigned to Canon K.K. (Tokyo).

"Measuring device, measuring method, substrate processing apparatus, and method of manufacturing product" was invented by Wataru Yamaguchi (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A measuring device for measuring a position of a pattern includes a wavelength variable unit configured to vary a spectrum of first light in accordance with an incident position at which the first light is incident to allow the first light to pass therethrough, and a moving unit configured to change the incident position by moving the wavelength variable unit. The wavelength variable unit is ...