US Patent Issued to CANON on Aug. 19 for "Exposure apparatus, exposure method, and article manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,393,128, issued on Aug. 19, was assigned to CANON K.K. (Tokyo).

"Exposure apparatus, exposure method, and article manufacturing method" was invented by Takahiro Takiguchi (Tochigi, Japan), Jun Kawashima (Tochigi, Japan) and Jun Moizumi (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An exposure apparatus that performs an exposure operation of exposing a substrate via a projection optical system is provided. The apparatus includes a temperature regulator configured to regulate a temperature distribution on an optical element of the projection optical system, and a controller configured to perform, in an exposure operation period in which t...