US Patent Issued to CANON on Aug. 12 for "Detection device, detection method, lithography apparatus, and article manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,386,276, issued on Aug. 12, was assigned to CANON K.K. (Tokyo).

"Detection device, detection method, lithography apparatus, and article manufacturing method" was invented by Kohei Senshu (Tokyo) and Toshiki Iwai (Saitama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Device detects a relative position between first and second marks arranged to be superimposed The device includes illumination system to illuminate the first and second marks with first illumination light, first detection system including first image sensor and first aperture stop and configured to form images of diffracted lights from the first and second marks illuminated with the ...