US Patent Issued to CANON on April 8 for "Nanoimprint lithography template with peripheral pockets, system of using the template, and method of using the template" (Texas Inventor)

ALEXANDRIA, Va., April 9 -- United States Patent no. 12,269,282, issued on April 8, was assigned to CANON K.K. (Tokyo).

"Nanoimprint lithography template with peripheral pockets, system of using the template, and method of using the template" was invented by Anshuman Cherala (Austin, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "A nanoimprint lithography template, a system for using the template and a method of using the template. The template may comprise a body having a front side with a shaping surface. The back side may have a central core-out that is located opposite the shaping surface. A first peripheral region may be bounded by: the central core-out; a first edge of the template; and a first s...