ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,550,746, issued on Feb. 10, was assigned to Canon Kabishiki Kaisha (Tokyo).
"Substrate and method of manufacturing substrate" was invented by Mitsunori Toshishige (Kanagawa, Japan) and Yoshiyuki Fukumoto (Kanagawa, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a method of manufacturing a substrate including an alignment mark, including: forming the alignment mark and a recess portion on the substrate, the alignment mark not penetrating the substrate and including a bottom portion with a lower infrared transmittance than that of a first surface and a second surface of the substrate; and aligning the substrate by orthogonally arranging ...