ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,206, issued on May 27, was assigned to CAMTEK LTD (Migdal Ha'emek, Israel).
"Inspection system for edge and bevel inspection of semiconductor structures" was invented by Carmel Yehuda Drillman (Haifa, Israel), Mordi Dahan (Kiryat Bialik, Israel), Moshe Edri (Kiryat Tivon, Israel), Ohad Shimon (Ramat Yishai, Israel), Shimon Koren (Haifa, Israel) and Gil Perlberg (Zichron Yaakov, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "An inspection system and method are presented for edge and bevel inspection of a semiconductor structure using and an optical system defining: a tangential imaging providing back-light tangential illumination propagating a...