US Patent Issued to Bruker Nano on Sept. 23 for "Chemical-mechanical polishing system with a potentiostat and pulsed-force applied to a workpiece" (California Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,420,374, issued on Sept. 23, was assigned to Bruker Nano Inc. (San Jose, Calif.).

"Chemical-mechanical polishing system with a potentiostat and pulsed-force applied to a workpiece" was invented by Vladimir Gulkov (San Jose, Calif.) and Nikolay Yeremin (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Shortcomings associated with insufficient control of a conventional CMP-process are obviated by providing an CMP-apparatus configured to complement a constant force (to which a workpiece that is being polished is conventionally exposed) with a time-alternating force and/or means for measuring an electrical characteristic of the CMP-process. ...