US Patent Issued to BMF Nano Material Technology on March 18 for "Methods of controlling dimensions in projection micro stereolithography" (California Inventor)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,251,879, issued on March 18, was assigned to BMF Nano Material Technology Co. Ltd. (Shenzhen, China).

"Methods of controlling dimensions in projection micro stereolithography" was invented by Chunguang Xia (San Diego).

According to the abstract* released by the U.S. Patent & Trademark Office: "Parallel surfaces on two substrates are established with specific distances of separation, typically within a 10-micron tolerance. In general, one surface is a surface of a transparent membrane or hard window. On one embodiment, the gap defined by the distance of the transparent membrane or hard window and the other surface used to precisely control the dimensions of layers in projection micro...