ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,397,500, issued on Aug. 26, was assigned to BMF Nano Material Technology Co. Ltd (Shenzhen, China).
"System and method of low-waste multi-material resin printing" was invented by Chunguang Xia (San Diego).
According to the abstract* released by the U.S. Patent & Trademark Office: "A multi-material 3-D printing system and method including at least two printing heads each with a transparent window circumscribed by an ejection nozzle. Each ejection nozzle is coupled to a respective pump that pumps resin from a respective vat onto a respective window. The resin is cured from below the window by exposure to a digital image displayed by a micro display chip. To switch resins, the sample is...