ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,415,100, issued on Sept. 16, was assigned to BMC MEDICAL Co. LTD. (Beijing).
"Headband assembly and mask system" was invented by Lina Liu (Beijing), Mingzhao Zhou (Beijing) and Zhi Zhuang (Beijing).
According to the abstract* released by the U.S. Patent & Trademark Office: "A headband assembly and a respiratory-mask system, wherein the headband assembly is of a planar structure in a spread and deployed state, and the headband assembly includes a head-mounting part (1) that is for clinging to and being worn on a head and connecting parts (2) that are connected to two sides of the head-mounting part (1) and are for connecting a respiratory mask; and the head-mounting part (1) includes...