ALEXANDRIA, Va., April 9 -- United States Patent no. 12,273,675, issued on April 8, was assigned to BESTECHNIC (SHANGHAI) Co. LTD. (Shanghai).
"Leakage compensation method and system for headphone" was invented by Qian Li (Shanghai), Zhicong Wang (Shanghai) and Xingqiang Wu (Shanghai).
According to the abstract* released by the U.S. Patent & Trademark Office: "In certain aspects, a leakage compensation method and system for a headphone are disclosed. An audio reference signal is obtained responsive to an audio signal to be played by a speaker of the headphone. An audio feedback signal is obtained based on a microphone signal acquired by a microphone of the headphone responsive to the audio signal being played by the speaker. One or more c...