US Patent Issued to BENEQ on Sept. 23 for "Method and apparatus for processing surface of a semiconductor substrate" (Finnish Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,421,596, issued on Sept. 23, was assigned to BENEQ OY (Espoo, Finland).

"Method and apparatus for processing surface of a semiconductor substrate" was invented by Mikko Soderlund (Espoo, Finland), Pasi Merilainen (Espoo, Finland), Patrick Rabinzohn (Espoo, Finland) and Markus Bosund (Espoo, Finland).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and apparatus for processing a surface of a substrate with a cluster apparatus including a transport chamber and two or more process reactors connected to the transport chamber. The method further includes subjecting the surface of the substrate to a surface preparation step for providing a prepared sub...