ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,492,473, issued on Dec. 9, was assigned to BEILab corp. (Ansan-si, South Korea).
"Roll to roll atomic layer deposition apparatus" was invented by Jihyun Seo (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Proposed is a roll to roll atomic layer deposition method, which deposits an atomic layer on a porous material, the roll to roll atomic layer deposition method including: moving, by a pair of winding rollers, reciprocatingly the porous material in a longitudinal direction; supplying, by one or more source substance suppliers, a source substance to the porous material while the porous material is moving reciprocatingly in the longit...