US Patent Issued to BEIJING NAURA MICROELECTRONICS EQUIPMENT on Sept. 9 for "Coil structure and plasma processing apparatus" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,412,731, issued on Sept. 9, was assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT Co. LTD. (Beijing).

"Coil structure and plasma processing apparatus" was invented by Jinrong Zhao (Beijing), Ying Zhang (Beijing), Xing Chen (Beijing), Gang Wei (Beijing), Chen Niu (Beijing), Jinji Xu (Beijing) and Song Wang (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "A coil structure includes a coil set including a first coil and a second coil. The first coil and the second coil are wound to form an annular area. A first end of the first coil and a first end of the second coil are close to an inner ring of the annular area. A second end of the first coil a...