US Patent Issued to BEIJING NAURA MICROELECTRONICS EQUIPMENT on Sept. 30 for "Semiconductor process chamber, semiconductor process equipment, and semiconductor process method" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,431,376, issued on Sept. 30, was assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT Co. LTD. (Beijing).

"Semiconductor process chamber, semiconductor process equipment, and semiconductor process method" was invented by Yongfei Wang (Beijing), Qing She (Beijing) and Yunfeng Lan (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor process chamber includes: a reaction chamber; a transfer chamber below the reaction chamber connected to the transfer chamber through a bottom opening; a base with a lifting shaft connected to a bottom of the base, where the base is able to rise and descend between the reaction chamber and the transfer cham...