US Patent Issued to BEIJING NAURA MICROELECTRONICS EQUIPMENT on March 25 for "Wafer cleaning apparatus and wafer transfer device" (Chinese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,067, issued on March 25, was assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT Co. LTD. (Beijing).

"Wafer cleaning apparatus and wafer transfer device" was invented by Hongshuai Ma (Beijing), Hongyu Zhao (Beijing) and Ruiting Wang (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer cleaning apparatus and a wafer transfer device. The wafer transfer device includes a machine bracket, a drive mechanism, a retractable bracket, and a plurality of wafer support brackets. The drive mechanism and the retractable bracket are arranged at the machine bracket. An end of the retractable bracket is fixedly connected to the machine bracket. The sec...