US Patent Issued to BEIJING NAURA MICROELECTRONICS EQUIPMENT on March 25 for "Semiconductor processing apparatus and dielectric window cleaning method of semiconductor processing apparatus" (Chinese Inventor)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,257,608, issued on March 25, was assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT Co. LTD. (Beijing).

"Semiconductor processing apparatus and dielectric window cleaning method of semiconductor processing apparatus" was invented by Chunming Liu (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure provide a semiconductor processing apparatus and a dielectric window cleaning method of the semiconductor processing apparatus. The semiconductor apparatus includes a reaction chamber and a dielectric window arranged in the reaction chamber, an induction coil and a cleaning electrode, both located above the dielectri...