US Patent Issued to BEIJING NAURA MICROELECTRONICS EQUIPMENT on March 25 for "Semiconductor process apparatus and plasma ignition method" (Chinese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,022, issued on March 25, was assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT Co. LTD. (Beijing).

"Semiconductor process apparatus and plasma ignition method" was invented by Jing Yang (Beijing), Chenyu Zhong (Beijing) and Gang Wei (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a semiconductor process apparatus and a plasma ignition method. The semiconductor process apparatus includes a reaction chamber, an air inlet assembly configured to introduce the reaction gas into the reaction chamber, an upper electrode assembly configured to excite the reaction gas into the plasma, a monitor configured to monito...