ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,494,391, issued on Dec. 9, was assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT Co. LTD. (Beijing).
"Semiconductor processing apparatus" was invented by Xiaoyan Ren (Beijing), Yongfei Wang (Beijing), Xiaoping Shi (Beijing), Yunfeng Lan (Beijing), Haifeng Qin (Beijing), Wenqiang Zhang (Beijing) and Hao Wang (Beijing).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor processing apparatus includes a process chamber, a gas intake device, a base, and a flow guide structure. The process chamber includes a process area and a transfer area arranged from top to bottom, the gas intake device is disposed at a top of the process chamber for introduci...